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Journal of Photopolymer Science and Technology

Volumn 13, Issue 5, 2000, Pages 673-677

Effect of ethyl group in sensitization mechanisms of pyrromethene dyes in photopolymer coating layer

(5) Urano, Toshiyuki a,b Ohno Okumura, Eiko c Sakamoto, Keiichi d Suzuki, Shota b Yamaoka, Tsuguo b

a Mitsubishi Kagaku Corporation (Japan)

b CHIBA UNIVERSITY (Japan)

c Research Institute of Chemical Science Technology and Education (Japan)

d Dept of Information Processing Engineering College of Industrial Technology 1 27 1 Nishikoya (Japan)

Author keywords

Laser; Photopolymerization; Pyrromethene; Sensitizer

Indexed keywords

1,3,5,7,9 PENTAMETHYLBIPYRROMETHENE DIFLUOROBORATE; 2,8 DIETHYL 1,3,5,7,9 PENTAMETHYLBIPYRROMETHENE DIFLUOROBORATE; 3,3',4,4' TETRAKIS(BUTYLPEROXYCARBONYL)BENZOPHENONE; DYE; POLY(METHYL METHACRYLATE); POLYMER; PYRROMETHENE; UNCLASSIFIED DRUG;

ANALYTIC METHOD; ARTICLE; CYCLIC POTENTIOMETRY; FILM; FILM COATING; IMAGING SYSTEM; PHOTOLYSIS; POLYMERIZATION; SENSITIZATION;

EID: 0034583975 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.13.673 Document Type: Article

Times cited : (4)

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