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Volumn 13, Issue 3, 2000, Pages 395-396
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High-sensitive negative resist materials based on polysilane derivatives
a a a a a a |
Author keywords
Electron beam; Negative resist; Polysilane; Positive resist; X rays; rays
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Indexed keywords
DIMETICONE;
AQUEOUS SOLUTION;
ARTICLE;
CROSS LINKING;
DERIVATIZATION;
ELECTRON BEAM;
MATERIAL COATING;
STRUCTURE ANALYSIS;
VOLATILIZATION;
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EID: 0034583938
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.13.395 Document Type: Article |
Times cited : (4)
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References (6)
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