Stability of radicals in aryl-substituted polysilanes with linear and planar silicon skeleton structures

Journal of Physical Chemistry B

Volumn 102, Issue 43, 1998, Pages 8367-8371

  Seki, Shu ^a,c   Cromack, Keith R ^a   Trifunac, Alexander D ^a   Yoshida, Yoichi ^b   Tagawa, Seiichi ^b   Asai, Keisuke ^c   Ishigure, Kenkichi ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TOKYO   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001635050     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp981412l     Document Type: Article

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