Suppression of Tungsten irregular growth in W chemical vapor deposition

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue 1, 2000, Pages 169-172

  Morita, Tomoyuki ^a   Harada, Yusuke ^a   Oki, Hisanori ^a   Onoda, Hiroshi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Low temperature; W CVD

Indexed keywords

ADHESION; ANNEALING; CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE EFFECTS; NUCLEATION; REDUCTION; SCANNING ELECTRON MICROSCOPY; SILANES; TRANSMISSION ELECTRON MICROSCOPY;

REDUCTION GASES;

TUNGSTEN;

EID: 0034583769     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)