Damage-free contact etching using balanced electron drift magnetron etcher

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue 1, 2000, Pages 102-105

  Kaihara, Ryu ^a   Hirayama, Masaki ^a   Sugawa, Shigetoshi ^a   Ohmil, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Balanced Electron Drift (BED); Damage free Etching; E B drift; Ion Reactive Etching (RIE)

Indexed keywords

CONTACT ETCHING; ELECTRON DRIFT MAGNETRON ETCHERS;

ELECTRODES; ELECTRONS; MAGNETRONS; REACTIVE ION ETCHING; SILICA;

PLASMA ETCHING;

EID: 0034583736     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSM.2000.993626     Document Type: Conference Paper

References (3)