Synthesis of aluminum nitride films by activated reactive ion plating with a cathodic arc source

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 167-170

  Xin, Hai Wei ^a   Tian, Lin Hai ^b   Pan, Jun De ^b   He, Qi ^b   Xu, Zhong ^b   Zhang, Zhi Ming ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Activated reactive ion plating; Aluminum nitride films; Cathodic arc source; Glow discharge

Indexed keywords

ALUMINUM ALLOY; CATHODIC ARC PLASMA DEPOSITION; CONDUCTION; FILM; INSULATOR;

EID: 0034535298     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00756-8     Document Type: Conference Paper

References (13)