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Volumn 33, Issue 3-4, 1997, Pages 133-136

Reactive partially ionized beam deposition of AlN thin films

Author keywords

AIN films; Deposition; Reactive partially ionized beam method

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; POLYCRYSTALLINE MATERIALS; QUARTZ; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON WAFERS; STOICHIOMETRY; SYNTHESIS (CHEMICAL); THIN FILMS;

EID: 0031354558     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(97)00088-8     Document Type: Article
Times cited : (4)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.