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Volumn 33, Issue 3-4, 1997, Pages 133-136
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Reactive partially ionized beam deposition of AlN thin films
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Author keywords
AIN films; Deposition; Reactive partially ionized beam method
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Indexed keywords
CRYSTAL STRUCTURE;
DEPOSITION;
POLYCRYSTALLINE MATERIALS;
QUARTZ;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SILICON WAFERS;
STOICHIOMETRY;
SYNTHESIS (CHEMICAL);
THIN FILMS;
ALUMINUM NITRIDE;
REACTIVE PARTIALLY IONIZED BEAM DEPOSITION;
SEMICONDUCTING FILMS;
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EID: 0031354558
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-577X(97)00088-8 Document Type: Article |
Times cited : (4)
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References (15)
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