Plasma diagnostics in industry

Plasma Physics and Controlled Fusion

Volumn 42, Issue 12 SUPPL. B, 2000, Pages

  Hopkins, M B ^a   Lawler, J F ^a  

^a Scientific Systems Ltd   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL EQUIPMENT; SEMICONDUCTOR DEVICE MANUFACTURE;

INDUSTRIAL PLASMA SOURCES;

PLASMA DIAGNOSTICS;

EID: 0034515009     PISSN: 07413335     EISSN: None     Source Type: Journal    
DOI: 10.1088/0741-3335/42/12B/314     Document Type: Article

References (7)

1. The International Technology Roadmap for Semiconductors 1999 (Austin, TX: SEMATECH)
2. Kuo Y (ed) 1999 IBM J. Res. Develop. 43
3. Lieberman M A and Allen A J 1996 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
4. Chang C Y and Sze S M 1996 ULSI Technology (New York: McGraw-Hill)
5. Wurm S, Preis W and Klick M 1999 Solid State Technol. 42 103
6. US Patent Specifications 6061006A (2000) and 5808415A (1998)
7. St Braithwaite N, Booth J P and Cunge G 1996 Plasma Sources Sci. Technol. 5 677-84