SEERS-based process control for plasma etching

Solid State Technology

Volumn 42, Issue 6, 1999, Pages 103-108

  Wurm, Stefan ^a,c   Preis, Walter ^a   Klick, Michael ^b  

^a SIEMENS AG   (Germany)

^b Adolf Slaby Institut   (Germany)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007042202     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. D.J. Austin, Solid State Technology, p. 184, Sept. 1997.
2. Y. Ra, C.-H. Chen, J. Vac. Sci. Technol., A11, 2911, 1993.
3. M. Klick, W. Rehak, M. Kammeyer, Jpn. J. Appl. Phys., 36, 4625, 1997.
4. M. Klick, Frontiers in Low Temp. Plasma Diag. II, Bad Honnef, Germany, 1997.
5. S. Wurm, Lam Research Technical Symposium, Genf, 1998.
6. S. Wurm, et al., Proc. Of the Plasma Etch User Group, Fourth Intern. Workshop on Ad. Plasma Tools and Process Eng., pp. 2-7, Millbrae, CA, May 1998.