Depth-dependent electrical impedance distribution in Al2O3 films on Al(111)-detection of an inner barrier layer

Langmuir

Volumn 16, Issue 26, 2000, Pages 10309-10314

  Popova, I ^a   Zhukov, V ^a   Yates Jr , J T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CAPACITORS; CORROSION PROTECTION; DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC IMPEDANCE; ELECTRON TUNNELING; ELECTROSTATICS; X RAY PHOTOELECTRON SPECTROSCOPY;

INNER BARRIER LAYERS;

ALUMINA;

EID: 0034513293     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la001009h     Document Type: Article

References (25)

1. Wefers, K.; Misra, C. Oxides and Hydroxides of Aluminum; Alcoa Technical Paper No.19; Alcoa Laboratories, 1987.
2. Batra, I. P.; Kleinman, L. J. Electron Spectrosc. Relat. Phenom. 1984, 33, 175.
3. O'Connor, D. J.; Wouters, E. R.; Denier van der Gon, A. W.; Vrijomoeth, J.; Zagwijn, P. M.; Slijkerman, W. F. J.; Frenken, J. M. N.; van der Veen, J. F. Surf. Sci. 1993, 287/288, 438.
4. Trost, J.; Brune, H.; Wintterlin, J.; Behm, R. J.; Ertl, G. J. Chem. Phys. 1998, 108, 1740.
5. Ocal, C.; Basurco, B.; Ferrer, S. Surf. Sci. 1985, 157, 233.
6. Barr, T. L. J. Phys. Chem. 1978, 82, 1801.
7. Cabrera, N.; Mott, N. F. Rep. Prog. Phys. 1948, 12, 163.
8. Fehlner, F. P.; Mott, N. F. Oxid. Met. 1970, 2, 59.
9. Barr, T. L. J. Vac. Sci. Technol. A 1989, 7, 1677.
10. Lau, W. M. J. Appl. Phys. 1989, 65, 2047.
11. Lau, W. M. J. Appl. Phys. 1990, 67, 1504.
12. CRC Handbook of Chemistry and Physics, 71st ed.; Lide, D. R., Ed.; CRC Press: Boca Raton, FL, 1990.
13. Ocal, C.; Ferrer, S.; Garcia, N. Surf. Sci. 1985, 163, 335.
14. Penn, D. R. J. Electron Spectrosc. Relat. Phenom. 1976, 9, 29.
15. Zhukov, V.; Popova, I.; Fomenko, V.; Yates, J. T., Jr. Surf. Sci. 1999, 441, 240.
16. Popova, I.; Zhukov, V.; Yates, J.T., Jr. Manuscript in preparation.
17. Wagner, C. D.; Riggs, W. M.; Davis, L. E.; Moulder, J. F. Handbook of X-ray Photoelectron Spectroscopy; Muilenberg, G. E., Ed.; Perkin-Elmer Corp., Physical Electronics Division: Eden Prairie, MN, 1979.
18. Smentkowski, V. S.; Jänsch, H.; Henderson, M. A.; Yates, J. T., Jr. Surf. Sci. 1995, 330, 207.
19. Fromhold, A. T., Jr. Theory of Metal Oxidation, Part 1 -Fundamentals; Defects in Crystalline Solids Series, v. 9; North-Holland Publishing Company: Amsterdam, 1976.
20. 3, with the assumption of small changes in O(1s) intensity upon adsorption of high EA molecules.
21. Klein, N.; Albert, M. J. Appl. Phys. 1982, 53, 5840.
22. Chopra, K. L. Thin Film Phenomena; McGraw-Hill Book Co.: New York, 1969.
23. Atkinson, A. Rev. Mod. Phys. 1985, 57, 437.
24. Kuznetsova, A.; Burleigh,T. D.; Zhukov, V.; Blachere, J.; Yates, J. T., Jr. Langmuir 1998, 14, 2502.
25. Kuznetsova, A.; Yates, J. T., Jr.; et al. Submitted to Langmuir.