Generation of Double-Layer Steps on (010) Surface of Orthorhombic MoO3 via Chemical Etching at Room Temperature

Journal of Physical Chemistry B

Volumn 104, Issue 50, 2000, Pages 11891-11898

  Hsu, Z Y ^a   Zeng, H C ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSTS; CHEMICAL MODIFICATION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; CRYSTAL SYMMETRY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR CRYSTALS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

ETCHING MECHANISM; MODEL CATALYST FABRICATION;

MOLYBDENUM COMPOUNDS;

EID: 0034499485     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp001521b     Document Type: Article

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