Photoemission characteristics of diamond films

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 79-84

  Vouagner, D ^a   Show, Y ^b   Kiraly, B ^a,c   Champagnon, B ^a   Girardeau Montaut, J P ^a  

^a UNIVERSITÉ LYON 1   (France)

^b TOKAI UNIVERSITY   (Japan)

^c UNIVERSITY OF SZEGED   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; PHOTOEMISSION; PULSED LASER APPLICATIONS; QUANTUM EFFICIENCY; ULTRAVIOLET RADIATION;

ELECTRON AFFINITY; PHOTOCATHODES; PHOTOELECTRIC EMISSIONS;

DIAMOND FILMS;

EID: 0034499137     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00595-X     Document Type: Article

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