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Volumn 349, Issue , 2000, Pages 95-98
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Synthesis and resist evaluation of photosensitive polyimides
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL BONDS;
IRRADIATION;
MOLECULAR ORIENTATION;
MOLECULAR STRUCTURE;
MOLECULAR WEIGHT;
PHOTODEGRADATION;
PHOTORESISTS;
PHOTOSENSITIVITY;
POLYMERIZATION;
SYNTHESIS (CHEMICAL);
THERMAL EFFECTS;
ULTRAVIOLET RADIATION;
IMIDE MOIETY;
MONOMER STRUCTURE;
NOVEL PHOTODEGRADABLE POLYIMIDES;
PHOTOSENSITIVE POLYIMIDES;
POSITIVE TONE IMAGE;
PYROMELLITIC DIANHYDRIDE;
RESIST EVALUATION;
SULFONYL OXYIMIDE;
POLYIMIDES;
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EID: 0034481605
PISSN: 1058725X
EISSN: None
Source Type: Journal
DOI: 10.1080/10587250008024874 Document Type: Article |
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Times cited : (2)
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References (4)
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