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Volumn 9, Issue 4, 2000, Pages 551-556

Three-axes monolithic silicon low-g accelerometer

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION SENSOR; ANISOTROPIC WET CHEMICAL ETCHING; POTASSIUM HYDROXIDE; SILICON SPRING MASS SYSTEM;

EID: 0034467239     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.896778     Document Type: Article
Times cited : (46)

References (9)
  • 3
    • 0029517997 scopus 로고
    • A novel 3-axis monolitic silicon accelereometer
    • Stockholm, Sweden, June
    • G. I. Anderson, "A novel 3-axis monolitic silicon accelereometer," in Proc Eighth Int. Conf. Solid-State Sensors Actuators, Stockholm, Sweden, June 1995, pp. 558-561.
    • (1995) Proc Eighth Int. Conf. Solid-State Sensors Actuators , pp. 558-561
    • Anderson, G.I.1
  • 8
    • 0030156411 scopus 로고    scopus 로고
    • Precise mask alignment to the crystallographic orientation of silicon wafers using wetchemical anisotropic etching
    • M. Vangbo and Y. Bäcklund, "Precise mask alignment to the crystallographic orientation of silicon wafers using wetchemical anisotropic etching," J. Micromech. Microeng., vol. 6, pp. 279-284, 1996.
    • (1996) J. Micromech. Microeng. , vol.6 , pp. 279-284
    • Vangbo, M.1    Bäcklund, Y.2
  • 9
    • 0029489892 scopus 로고
    • Alignment of mask patterns to crystal orientation
    • Stockholm, Sweden, June
    • G. Ensell, "Alignment of mask patterns to crystal orientation," in Proc. Eighth Int. Conf. Solid-State Sensors Actuators, Stockholm, Sweden, June 1995, pp. 186-189.
    • (1995) Proc. Eighth Int. Conf. Solid-State Sensors Actuators , pp. 186-189
    • Ensell, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.