SCOPUS 정보 검색 플랫폼

Volumn , Issue , 2000, Pages 205-209

Application of MESA™ modeling for chemical mechanical polishing

(3) Laursen, T a Runnels, S R a Toprac, A a

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHEMICAL MECHANICAL POLISHING; COMPUTER SIMULATION; COMPUTER SOFTWARE; INTERFACES (MATERIALS); SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; SURFACE TOPOGRAPHY;

PATTERNED WAFERS;

WSI CIRCUITS;

EID: 0034460693 PISSN: 10480854 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (3)

References (7)

1
- 0001849366
- (1999) CMPMIC '99 Proceedings , pp. 128-135
- Runnels, S.R.¹ Kim, I.² Miceli, F.³

2
- 0000617430
- AMC99 Proceedings
- (2000) MRS Conf. Proc. ULSI , vol.15 , pp. 677-681
- Laursen, T.¹ Runnels, S.R.² Basak, S.³ Grief, M.⁴ Murella, K.⁵

3
- 0033076595
- (1999) J. Electrochem. Soc. , vol.146 , pp. 744-748
- Chen, D.-Z.¹ Lee, B.-S.²

4
- 0005641311
- Honolulu, HA, Oct. 1999
- (1999) CMP Symposium, Electrochemical Society Meeting
- Tugbawa, T.¹ Park, T.² Boning, D.³ Pan, T.⁴ Li, P.⁵ Hymes, S.⁶ Brown, T.⁷ Camilletti, L.⁸

5
- 0005547993
- June 2000
- (2000) Solid State Technology , pp. 111-121
- Yang, L.¹

6
- 0005605856
- to be published
- Laursen, T.¹ Kim, I.² Schlueter, J.³ Runnels, S.R.⁴

7
- 0004097994
- McGraw-Hill
- (1970) Theory of Elasticity (3rd Edition)
- Timoshenko, S.¹ Goodier, J.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.