Characterization and integration of a new Si-O-C film deposited by CVD

Advanced Metallization Conference (AMC)

Volumn , Issue , 2000, Pages 595-601

  Donaton, R A ^a   Struyf, H ^a   Lepage, M ^a   Coenegrachts, B ^a   Stucchi, M ^a   De Roest, D ^a   Baklanov, M R ^a   Vanhaelemeersch, S ^a   Maex, K ^a   Gaillard, F ^a   Xia, L Q ^a   Lim, T H ^a   Gotuaco, M ^a   Yieh, E ^a   Van Autryve, L ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; INTERCONNECTION NETWORKS; SEMICONDUCTING SILICON COMPOUNDS; THERMODYNAMIC STABILITY;

ORGANOSILICATES;

DIELECTRIC FILMS;

EID: 0034459975     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. Presented at 2000 MRS spring meeting
2. Presented at 2000 MRS spring meeting