50-nm vertical sidewall transistors with high channel doping concentrations

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 61-64

  Schulz, T ^a   Rosner W ^a   Risch, L ^a   Langmann, U ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRODEPOSITION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

HIGH CHANNEL DOPING;

MOSFET DEVICES;

EID: 0034453372     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)