Low thermal budget elevated source/drain technology utilizing novel solid phase epitaxy and selective vapor phase etching

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 433-436

  Miyano, K ^a   Mizushima, I ^a   Hokazono, A ^a   Ohuchi, K ^a   Tsunashima, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; POLYSILICON; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY;

SELECTIVE VAPOR PHASE ETCHING;

SOLID STATE DEVICE STRUCTURES;

EID: 0034452565     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)