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Volumn 613, Issue , 2000, Pages

An evaluation of the effects of Benzotriazole in NH4OH slurry for copper CMP

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ADDITION REACTIONS; AMMONIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; COMPOSITION EFFECTS; DISSOLUTION; ELECTROMIGRATION; SLURRIES;

EID: 0034433367     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-613-e7.4.1     Document Type: Conference Paper
Times cited : (2)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.