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Volumn 39, Issue 12 B, 2000, Pages 6919-6922

Deposition and characterization of Ta, TaNx and Ta4B films for next-generation lithography mask applications

Author keywords

Absorber; Mask; Next generation lithography; Ta; Ta4B; TaNx

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL MICROSTRUCTURE; DIFFUSION; MASKS; OXYGEN; SPUTTER DEPOSITION; TANTALUM; TANTALUM COMPOUNDS; THIN FILMS;

NEXT-GENERATION LITHOGRAPHY (NGL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034430334 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.6919 Document Type: Article

Times cited : (4)

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