Barrier-controlled transport in doped microcrystalline Si

Materials Research Society Symposium - Proceedings

Volumn 609, Issue , 2000, Pages

  Brehme, S ^a   Kanschat, P ^a   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; INTERFACES (MATERIALS); SEMICONDUCTING SILICON; THIN FILMS; TRANSPORT PROPERTIES;

MICROCRYSTALLINE SILICON;

CRYSTALLINE MATERIALS;

EID: 0034429799     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-609-a32.2     Document Type: Conference Paper

References (14)