Effect of thermal processing on multilayer porous silicon microcavity

Physica Status Solidi (A) Applied Research

Volumn 182, Issue 1, 2000, Pages 319-324

  Zhou, Y ^a   Snow, P A ^a   Russell, P St J ^a  

^a University of Bath   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HIGH TEMPERATURE EFFECTS; MULTILAYERS; NITROGEN; OXIDATION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

MICROCAVITY; REFLECTIVITY SPECTRA; THERMAL PROCESSING;

POROUS SILICON;

EID: 0034427303     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200011)182:1<319::AID-PSSA319>3.0.CO;2-O     Document Type: Article

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