Formation of 3D dielectric structures by initiating polymerization with the fourth harmonic of a Nd laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4423, Issue , 2000, Pages 74-78

  Alexandrov, A P ^a   Muraviov, S V ^a   Babina, N A ^a   Bityurin, N M ^a  

^a INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

Author keywords

Laser photopolymerization; Microfabrication technology; Three dimensional structure

Indexed keywords

BLEACHING; DIELECTRIC MATERIALS; LASER APPLICATIONS; LIGHT ABSORPTION; MONOMERS; PHOTOPOLYMERIZATION; Q SWITCHED LASERS; STRUCTURE (COMPOSITION);

DIELECTRIC STRUCTURES; ETHYLENEGLYCOLMONOMETHACRYLATE; HARMONIC RADIATION; INITIATING POLYMERIZATION; METHYL NETHACRYLATE; MICROFABRICATION TECHNOLOGY; POLYMER STRUCTURES;

NEODYMIUM LASERS;

EID: 0034425319     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.431205     Document Type: Conference Paper

References (7)

1. Three-dimensional with two-photon-absorbed photopolymerization
2. Three-dimensional microfabrication by use of single-photon-absorbed polymerization
3. Micro fabrication by UV laser photopolymerization
4. Three-dimensional optical circuitry using two-photon-assisted polymerization
5. Photofabrication of three-dimensional photonic crystals by multibeam laser interference into a photopolymerizable resin
6. Three-dimensional photonic crystal structures achieved with two-photon-absorption photopolymerization of resin
7. Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication