The microstructural development of Ag/Ni multilayers during annealing

Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties

Volumn 80, Issue 8, 2000, Pages 1867-1877

  Schweitz, K O ^a   Ratzke K ^b   Foord, D ^c   Thomas, P J ^c   Greer, A L ^c   Geisler, H ^a,d   Chevallier, J ^a   Bottiger, J ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b UNIVERSITY OF KIEL   (Germany)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^d DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRON ENERGY LOSS SPECTROSCOPY; INTERFACIAL ENERGY; METALLOGRAPHIC MICROSTRUCTURE; NICKEL; NUCLEATION; SILVER; TEXTURES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DESTRATIFICATION; DIFFUSIONAL MASS TRANSPORT; MULTILAYER BREAK-UP; THERMODYNAMIC EQUILIBRIUM;

MULTILAYERS;

EID: 0034413216     PISSN: 01418610     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418610008219090     Document Type: Article

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