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Volumn 11, Issue 2, 2000, Pages 129-135

Kinetic Analysis of the Chemical Processes in the Decomposition of Gaseous Dielectrics by a Non-Equilibrium Plasma - Part 2: SF6 and SF6/O2

Author keywords

Rate of production analysis; Sensitivity analysis; SF6 decomposition

Indexed keywords


EID: 0034409218     PISSN: 01035053     EISSN: None     Source Type: Journal    
DOI: 10.1590/S0103-50532000000200005     Document Type: Article
Times cited : (8)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.