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Volumn 11, Issue 2, 2000, Pages 129-135
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Kinetic Analysis of the Chemical Processes in the Decomposition of Gaseous Dielectrics by a Non-Equilibrium Plasma - Part 2: SF6 and SF6/O2
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Author keywords
Rate of production analysis; Sensitivity analysis; SF6 decomposition
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Indexed keywords
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EID: 0034409218
PISSN: 01035053
EISSN: None
Source Type: Journal
DOI: 10.1590/S0103-50532000000200005 Document Type: Article |
Times cited : (8)
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References (34)
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