Improvement of silicon direct bonding using surfaces activated by hydrogen plasma treatment

Journal of the Korean Physical Society

Volumn 37, Issue 6, 2000, Pages 878-881

  Choi, Woo Beom ^a   Ju, Chul Min ^a   Lee, Jong Seok ^a   Sung, Man Young ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034347674     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.878     Document Type: Article

References (10)

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