Ultrathin oxide grown on polysilicon by using an electron cyclotron resonance N2O plasma

Journal of the Korean Physical Society

Volumn 37, Issue 6, 2000, Pages 893-896

  Han, Sangyeon ^a   Shin, Hyungcheol ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034347665     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.893     Document Type: Article

References (7)

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