Maskless micro-ion-beam reduction lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2783-2790

  Ngo, V V ^a   Barletta, W ^a   Gough, R ^a   Lee, Y ^a   Leung, K N ^a   Zahir, N ^a   Patterson, D ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b DEFENSE ADVANCED RESEARCH PROJECTS AGENCY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033265187     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591065     Document Type: Article

References (11)

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4. Y. Lee et al., Microelectron. Eng. 41/42, 241 (1998).
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8. MUNRO Electron Beam Software Ltd. (OPTICS User Manual, Part 2, VI. 40).
9. Y. Lee et al., J. Vac. Sci. Technol. B 14, 6 (1996).
10. A. J. Bleeker, in Proceedings of the International Meeting on Ion Projection Lithography, Vienna, 1998.
11. E. Munro, J. Vac. Sci. Technol. B 15, 6 (1997).