Reactive cylindrical magnetron deposition of titanium nitride and zirconium nitride films

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1996, Pages 97-103

  Siegfried, D E ^a   Cook, D ^a   Glocker, D ^a  

^a YesTech Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; FILMS; MAGNETRON SPUTTERING; SUBSTRATES; TITANIUM NITRIDE; ZIRCONIUM COMPOUNDS;

HOLLOW CATHODE SPUTTERING; INVERTED CYLINDRICAL MAGNETRON SPUTTERING; NITRIDE COATINGS; REACTIVE CYLINDRICAL MAGNETRON DEPOSITION;

SPUTTER DEPOSITION;

EID: 0030378541     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)