Cross-talk simulation in CMOS micromachined gas-sensors with electrothermal actuation

Sensors and Actuators, B: Chemical

Volumn 69, Issue 3, 2000, Pages 320-324

  Roncaglia, Alberto ^a   Colalongo, Luigi ^a   Lange, Dirk ^b   Rudan, Massimo ^a  

^a UNIVERSITY OF BOLOGNA   (Italy)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CMOS INTEGRATED CIRCUITS; COMPUTATIONAL COMPLEXITY; COMPUTER SIMULATION; CROSSTALK; ELECTRIC POTENTIAL; FINITE ELEMENT METHOD; HEAT RESISTANCE; PIEZOELECTRICITY; THERMISTORS; THERMOELECTRICITY;

CAPACITIVE CROSSTALK; CROSSTALK SIMULATION; DEVICE LEVEL SIMULATION; HEATING RESISTORS; RESONANT CANTILEVER GAS SENSOR;

ELECTROCHEMICAL SENSORS;

EID: 0034294030     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00480-9     Document Type: Article

References (4)

1. Lange D., Koll A., Brand O., Baltes H. CMOS chemical microsensors based on resonant cantilever beams. Proc. SPIE, San Diego. 1998;233-243.
2. ISE Integrated systems engineering, Modeling of Semiconductor Technology, Devices and Systems - ISE TCAD Manuals, V. 5.0, Part 14: DESSIS, 1998.
3. Prak A., Blom F.R., Elvenspoek M., Lammerink T.S. Q-factor and frequency shift of resonating silicon diaphragms in air. Sens. Actuators, A. 27:1991;691-698.
4. Blom F.R., Bouwstra S., Elwenspoek M., Fluitman J.H.J. Dependence of the quality factor of micromachined silicon beam resonators on pressure and geometry. J. Vac. Sci. Technol., B. 10(I):1992;19-26.