메뉴 건너뛰기




Volumn 44, Issue 10, 2000, Pages 1869-1873

Trade-off between the Kirk effect and the breakdown performance in resurfed lateral bipolar transistors for high voltage, high frequency applications

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY;

EID: 0034291095     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(00)00126-X     Document Type: Article
Times cited : (2)

References (10)
  • 1
    • 0028198028 scopus 로고
    • Device simulation of a thin-film silicon on insulator power metal-oxide-semiconductor field-effect transistor for structure optimization
    • Matsumoto S., Yoshino H. Device simulation of a thin-film silicon on insulator power metal-oxide-semiconductor field-effect transistor for structure optimization. Jpn J Appl Phys. 33:1994;519-523.
    • (1994) Jpn J Appl Phys , vol.33 , pp. 519-523
    • Matsumoto, S.1    Yoshino, H.2
  • 2
    • 0027803922 scopus 로고
    • A self-aligned lateral bipolar transistor realized on SIMOX-material
    • Edholm B., Olsson J., Soderbarg A. A self-aligned lateral bipolar transistor realized on SIMOX-material. IEEE Trans Electron Dev. 40(12):1993;2359-2360.
    • (1993) IEEE Trans Electron Dev , vol.40 , Issue.12 , pp. 2359-2360
    • Edholm, B.1    Olsson, J.2    Soderbarg, A.3
  • 3
    • 0027281476 scopus 로고
    • A high-performance lateral bipolar transistor fabricated on SIMOX
    • Parke S.A., Hu C., Ko P.K. A high-performance lateral bipolar transistor fabricated on SIMOX. IEEE Trans Electron Dev Lett. 14(1):1993;33-35.
    • (1993) IEEE Trans Electron Dev Lett , vol.14 , Issue.1 , pp. 33-35
    • Parke, S.A.1    Hu, C.2    Ko, P.K.3
  • 6
    • 0033313275 scopus 로고    scopus 로고
    • A high performance 60-V class lateral power MOSFET on thin film SOI with a graded doping profile in the drift region
    • Romania
    • Cao GJ, De Souza MM, Narayanan EMS. A high performance 60-V class lateral power MOSFET on thin film SOI with a graded doping profile in the drift region. Proc 22nd IEEE Int Semicond Conf. Romania, 1999. p. 123-6.
    • (1999) Proc 22nd IEEE Int Semicond Conf. , pp. 123-126
    • Cao, G.J.1    De Souza, M.M.2    Narayanan, E.M.S.3
  • 7
    • 0027149649 scopus 로고
    • Pein. Dependence of breakdown voltage on drift length and buried oxide thickness in SOI Resurf LDMOS transistors
    • California
    • Merchant S, Arnold E, Baumgart H, Egloff R, Letavic T, Mukherjee S. Pein. Dependence of breakdown voltage on drift length and buried oxide thickness in SOI Resurf LDMOS transistors. Proc 5th ISPSD. California, 1993. p. 124-8.
    • (1993) Proc 5th ISPSD. , pp. 124-128
    • Merchant, S.1    Arnold, E.2    Baumgart, H.3    Egloff, R.4    Letavic, T.5    Mukherjee, S.6
  • 10
    • 0024681269 scopus 로고
    • A simulation study of high-speed silicon heteroemitter bipolar transistors
    • Ugajin M., Konaka S., Yokoyama K., Amemiya Y. A simulation study of high-speed silicon heteroemitter bipolar transistors. IEEE Trans Electron Dev. 36(6):1989;1102.
    • (1989) IEEE Trans Electron Dev , vol.36 , Issue.6 , pp. 1102
    • Ugajin, M.1    Konaka, S.2    Yokoyama, K.3    Amemiya, Y.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.