Behavior of bulk micromachined silicon flow sensor in the negative differential resistance regime

Journal of Micromechanics and Microengineering

Volumn 10, Issue 3, 2000, Pages 421-429

  Gamage, Sisira K ^a   Okulan, Nihat ^a   Henderson, H Thurman ^a  

^a University of Cincinnati   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW MEASUREMENT; MICROMACHINING;

NEGATIVE DIFFERENTIAL RESISTANCE; SILICON FLOW SENSORS;

SILICON SENSORS;

EID: 0034276172     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/3/318     Document Type: Article

References (6)

1. Okulan N, Henderson H T and Ahn C H 1998 A new pulsed-mode micromachined flow sensor for an integrated microfluidic system Solid State Sensor and Actuator Workshop (Hilton Head Island, SC, June 8-11, 1998)
2. Okulan N, Henderson H T and Ahn C H 2000 A pulsed-mode micromachined flow sensor with temperature drift compensation IEEE Trans. Electron Devices 47 340-7
3. Betzner T M et al 1996 Structural design and characteristics of a thermally isolated, sensitivity-enhanced, bulk-micromachined, silicon flow sensor J. Micromech. Microeng. 6 217-27
4. in' t Hout S R 1996 High Temperature Silicon Sensors (Delft: Delft University Press)
5. Wasserrab Th 1997 Die Temperaturabhängigkeit der elektronischen Kenngrößen des eigenleitenden Siliciums Z. Naturf. a 32 746-9
6. Arora N D et al 1982 Electron and hole mobilities in silicon as a function of concentration and temperature IEEE Trans. Electron Devices 29 292-5