Fabrication of ZnO-doped Zr0.8Sn0.2TiO4 thin films by radio frequency magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2327-2332

  Huang, Cheng Liang ^a   Hsu, Cheng Shing ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; DEPOSITION; MAGNETRON SPUTTERING; MORPHOLOGY; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

ZIRCONIUM TIN TITANIUM OXIDE;

SEMICONDUCTING FILMS;

EID: 0034275222     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286143     Document Type: Article

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