Aluminum deposition and nucleation on nitrogen-incorporated tetrahedral amorphous carbon electrodes in ambient temperature chloroaluminate melts

Journal of the Electrochemical Society

Volumn 147, Issue 9, 2000, Pages 3370-3376

  Lee, Jae Joon ^a,e   Miller, Barry ^a,e   Shi, Xu ^b   Kalish, Rafi ^c   Wheeler, Kraig A ^d  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^d DELAWARE STATE UNIVERSITY   (United States)

^e ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS MATERIALS; CARBON; GRAPHITE ELECTRODES; NUCLEATION;

CHLOROALUMINATE MELTS; TETRAHEDRAL AMORPHOUS CARBON ELECTRODES;

ELECTRODEPOSITION;

EID: 0034273782     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393908     Document Type: Article

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