Effect of oxygen stoichiometry on the ferroelectric property of epitaxial all-oxide La0.7Sr0.3MnO3/Pb(Zr0.52Ti 0.48)O3/La0.7Sr0.3MnO3 thin-film capacitors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2412-2416

  Wu, Wenbin ^a,b   Wong, K H ^b   Mak, C L ^b   Choy, C L ^b   Zhang, Y H ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIELECTRIC FILMS; EPITAXIAL GROWTH; FERROELECTRICITY; LANTHANUM COMPOUNDS; PULSED LASER APPLICATIONS; STOICHIOMETRY; THERMODYNAMIC STABILITY; THIN FILM DEVICES;

PULSED LASER DEPOSITION (PLD); THIN-FILM CAPACITORS;

CAPACITORS;

EID: 0034272503     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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