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Volumn 270, Issue 1, 1999, Pages 253-258

Uranium dioxide reaction in CF4/O2 RF plasma

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADDITION REACTIONS; CARBON INORGANIC COMPOUNDS; FLUORINE; MASS SPECTROMETRY; PLASMA ETCHING; PLASMAS; REACTION KINETICS;

EID: 0032665903     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00906-4     Document Type: Article
Times cited : (23)

References (21)
  • 21
    • 0012393058 scopus 로고
    • in: D.M. Manos, D.L. Flamm (Eds.), Academic Press, New York
    • D.L. Flamm, in: D.M. Manos, D.L. Flamm (Eds.), Plasma Etching: An Introduction, Academic Press, New York, 1989, p. 91.
    • (1989) Plasma Etching: An Introduction , pp. 91
    • Flamm, D.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.