Microstructure evolution and leakage phenomena of CSD PLZT thin films

Integrated Ferroelectrics

Volumn 26, Issue 1, 1999, Pages 269-275

  Fujiki, Mitsushi ^a   Cross, Jeffrey S ^a   Tsukada, Mineharu ^a   Otani, Seigen ^a   Kotaka, Yasutoshi ^a   Goto, Yasuyuki ^a   Matsuura, Katsuyoshi ^a   Ashida, Hiroshi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DEPOSITION; ELECTRODES; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LEAKAGE CURRENTS; NUCLEATION; PYROLYSIS; SEMICONDUCTING LEAD COMPOUNDS; SILICON WAFERS;

CHEMICAL SOLUTION DEPOSITION; PYROCHLORE;

THIN FILMS;

EID: 0033329355     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589908215627     Document Type: Article

References (8)

1. T. Atsuki, N. Soyama, G.Sasaki, T. Yonezawa, K. Ogi, K. Sameshima, K. Hoshiba, Y. Nakao and A. Kamisawa, Jpn. J. Appl. Phys., 33, 5196-5200 (1994).
2. J. A. Voigt, B. A. Tuttle, T. J. Headley and D. L. Lamppa, Ferroelectric Thin Films IV, 395-402 (1995).
3. K. G. Brooks, R. D. Klissurska, P. Moeckli and N. Setter, J. Mater. Res., 12, 531-40 (1997).
4. M. J. Lefevre, J. S. Speck, R. W. Schwartz, D. Dimons and S. J. Lockwood, J. Mater. Res., 11, 2076-84 (1996).
5. M. Tsukada, M. Fujiki, J. S. Cross, K. Matsuura, A. Ashida and S. Otani, Proc. of the 18th Electronics Div. Meeting of the Ceram. Soc. of Jpn.(Electroceramics in Japan II), (1998, in press).
6. J.S. Cross, M. Fujiki and M. Tsukada, J. Mater. Res., submitted.
7. K. G. Brooks, I. M. Reaney, R. Klissurska, Y. Huang, L. Bursill and N. Setter, J. Mater. Res., 10, 2540-53 (1994).
8. I. Stolichnov and A. Tagantsev, J. Appl. Phys., 84, 3216 (1998).