Thin film processing by biased target ion beam deposition

IEEE Transactions on Magnetics

Volumn 36, Issue 5 I, 2000, Pages 2966-2971

  Hylton, T L ^a   Ciorneiu, B ^a   Baldwin, D A ^a   Escorcia, O ^a   Son, J ^a   McClure, M T ^b   Waters, G ^a  

^a CVC Inc ^*  (United States)

^b TRIQUINT SEMICONDUCTOR   (United States)

Author keywords

Cu thin films; Ion beam deposition; Magnetic recording; Spin valves; Sputter deposition

Indexed keywords

COPPER; FILM GROWTH; INTERFACES (MATERIALS); ION BEAM ASSISTED DEPOSITION; ION SOURCES; MAGNETIC RECORDING; METALLIC FILMS; SPUTTER DEPOSITION;

BIASED TARGET ION BEAM DEPOSITION (BTIBD); SPIN VALVES;

MAGNETIC THIN FILM DEVICES;

EID: 0034260911     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908643     Document Type: Article

References (10)

1. Biased target deposition
2. Oxygen as a surfactant in the growth of GMR spin valves
3. Low-energy high-flux reactive assisted deposition of oxide optical coatings: Performance, durability, stability and scalability
4. Atomistic simulations of the vapor deposition of Ni/Cu/Ni multilayers: The effects of adatom incident energy
5. Influence of energy reflected from the target on thin film characteristics
6. + ions sputtered from Cu by very low energy (50 eV < E < 1 keV) inert gas ions
7. End-Hall ion source
8. Technology of electron bombardment thrusters