Correlations among sputter pressure, thickness, and coercivity in Al/Co/Cu magnetic thin films sputter-deposited on Si(001)

IEEE Transactions on Magnetics

Volumn 36, Issue 5 I, 2000, Pages 2948-2950

  Barnes, B M ^a,b   Kelly IV, J J ^b   MacKay, J F ^c   O'Brien, W L ^c   Lagally, M G ^b  

^a IEEE   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c NONE

Author keywords

Cobalt; Coercive force; Rough surfaces; Sputter deposition

Indexed keywords

ALUMINUM ALLOYS; COERCIVE FORCE; FERROMAGNETISM; METALLIC FILMS; PRESSURE EFFECTS; SILICON; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; ULTRATHIN FILMS;

SPUTTER GAS PRESSURE;

MAGNETIC THIN FILMS;

EID: 0034260637     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908637     Document Type: Article

References (13)

1. Spin orientation transition in Ni films on Cu(100)
2. Effect of interface roughness on hysteresis loops of ultrathin Co films from 2 to 30 ML on Cu(001) surfaces
3. Thin film magnetic recording media
4. Nanostructural effects and interface magnetism in Co/Pd multilayers
5. Correlation of giant magnetoresistance with interfacial roughness in Co/Cu superlattices
6. Comparison of surface roughness of polished silicon wafers measured by light scattering topography, soft-x-ray scattering, and atomic-force microscopy
7. X-ray and neutron scattering from rough surfaces
8. Effects of nitrogen, oxygen, and air on the magnetic properties of sputtered CoCrTa thin film recording disks
9. Oxygen effect on the microstructure and magnetic properties of binary CoPt thin films for perpendicular recording
10. Magnetic anisotropies of ultrathin Co(001) films on Cu(001)
11. Thickness-dependent coercivity of ultrathin Co films on a rough substrate: Cu-buffered Si(111)
12. Transitions in the direction of magnetism in Ni/Cu(001) ultrathin films and the effects of capping layers