Optimization of physical filtering for selective high temperature H2 sensors

Sensors and Actuators, B: Chemical

Volumn 68, Issue 1, 2000, Pages 146-150

  Weh, T ^a   Fleischer, M ^a   Meixner, H ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETHANE; HIGH TEMPERATURE PROPERTIES; HYDROGEN; OPTIMIZATION; SEMICONDUCTING GALLIUM COMPOUNDS; SILICA; SPUTTER DEPOSITION;

GALLIUM OXIDE; HYDROGEN SENSOR; METAL OXIDE; PHYSICAL FILTERING;

CHEMICAL SENSORS;

EID: 0034250456     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00475-5     Document Type: Article

References (6)

1. 3 thin films. Sens. Actuators, B. 6-7:1998;257-261.
2. 3 Thin Films.
3. 3-Dünnschichten, Thesis, University of Gießen, 1996.
4. Fleischer M., Meixner H. Selectivity in high temperature operated semiconductor gas sensors. Sens. Actuators, B. 52:1998;179-187.
5. 2. Sens. Actuators, B. 52:1998;30-37.
6. 3. Sens. Actuators, B. 1998;258-262.