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Journal of Physics D: Applied Physics

Volumn 33, Issue 16, 2000, Pages 2074-2078

Europium silicate thin films on Si substrates fabricated by a radio frequency sputtering method

(4) Qi, Jifa a Matsumoto, Takahiro a Tanaka, Masanori a Masumoto, Yasuaki a,b

a JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

b UNIVERSITY OF TSUKUBA (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLUMINESCENCE; EUROPIUM COMPOUNDS; FILM PREPARATION; LUMINESCENT DEVICES; MAGNETRON SPUTTERING; QUANTUM THEORY; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON; STOICHIOMETRY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EUROPIUM OXIDE; EUROPIUM SILICATE THIN FILM; PERKIN-ELMER MODEL; RADIO FREQUENCY SPUTTERING METHOD; THERMAL ANNEALING;

THIN FILMS;

EID: 0034250221 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/33/16/321 Document Type: Article

Times cited : (44)

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