A new gas circulation RIE

IEEE Transactions on Semiconductor Manufacturing

Volumn 13, Issue 3, 2000, Pages 310-314

  Ohiwa, Tokuhisa ^a   Sakai, Itsuko ^a   Okumura, Katsuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Greenhouse effect; PFC; RIE; SiO2

Indexed keywords

AIR POLLUTION CONTROL; ARGON; CARBON MONOXIDE; FLOW OF FLUIDS; FLUOROCARBONS; GAS EMISSIONS; GLOBAL WARMING; GREENHOUSE EFFECT; REACTIVE ION ETCHING; SILICA;

ETCH RATE; GAS CIRCULATION; GLOBAL WARMING POTENTIAL; GREENHOUSE EFFECT SUPPRESSION; PER FLUORO COMPOUND;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034247126     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.857941     Document Type: Article

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