Magnetic behavior of atomically engineered NiO-Co-Cu-based giant magnetoresistance spin valves using Pb as a surface modifier

Acta Materialia

Volumn 48, Issue 13, 2000, Pages 3501-3508

  Chopra, Harsh Deep ^a   Repetski, Edward J ^a   Brown, H J ^b   Chen, P J ^b   Swartzendruber, L J ^b   Egelhoff Jr , W F ^b  

^a Thin Films and Nanosynthesis Lab   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COPPER; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); MAGNETIC ANISOTROPY; MAGNETIC COUPLINGS; MAGNETIZATION; MAGNETORESISTANCE; MORPHOLOGY; MULTILAYERS; NICKEL ALLOYS; SURFACE TREATMENT;

GIANT MAGNETORESISTANCE; MAGNETIC MULTILAYER; MAGNETIC STRUCTURE; ORANGE PEEL EFFECT;

MAGNETIC FILMS;

EID: 0034245997     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(00)00146-4     Document Type: Article

References (30)

1. Carcia P.F. J. Appl. Phys. 66:1988;5066.
2. Draaisma H.J.G., de Jonge W.J.M., den Broeder F.J.A. J. Magn. Magn. Mater. 66:1987;351.
3. den Broeder F.J.A., Kuiper D., van de Mosselaer A.P., Hoving H. Phys. Rev. Lett. 60:1988;2769.
4. Baibich M.N., Broto J.M., Fert A., Nguyen Van Dau F., Petroff F., Etienne P., Creuzet G., Friederich A., Chazelas J. Phys. Rev. Lett. 61:1988;2472.
5. Binash G., Grünberg P., Saurenbach F., Zinn W. Phys. Rev. B. 39:1989;4828.
6. Falicov L.M. Phys. Today. 45:1992;46.
7. Gay J.G., Smith J.R., Richter R., Arlinghaus F.J., Wagoner R.H. J. Vac. Sci. Technol. A. 2:1984;931.
8. Smith J.R., Banerjee A. Phys. Rev. Lett. 59:1987;2451.
9. Mezey L.Z., Giber J. Jpn. J. Appl. Phys. 21:1982;1569.
10. Tyson W.R., Miller W.A. Surf. Sci. 62:1977;267.
11. Miedema A.R., Dorleijn J.W.F. Surf. Sci. 95:1980;447.
12. Steigerwald D.A., Jacob I., Egelhoff W.F. Jr. Surf. Sci. 202:1988;472.
13. Egelhoff W.F. Jr. Bland J.A.C., Heinrich B. Ultrathin Magnetic Structures I: An Introduction to Electronic, Magnetic, and Structural Properties. 1994;Springer, Berlin.
14. Chambliss D.D., Wilson R.J., Ching S. J. Vac. Sci. Technol. B. 10:1992;1993.
15. Steigerwald D.A., Egelhoff W.F. Jr. Phys. Rev. Lett. 60:1988;2558.
16. Egelhoff W.F. Jr. J. Vac. Sci. Technol. A. 7:1989;2060.
17. Egelhoff W.F. Jr. J. Vac. Sci. Technol. A. 3:1985;1511.
18. Egelhoff W.F. Jr, Chen P.J., Powell C.J., Stiles M.D., McMichael R.D., Lin C.-L., Sivertsen J.M., Judy J., Takano K., Berkowitz A.E. J. Appl. Phys. 80:1996;5183.
19. Egelhoff W.F. Jr, Chen P.J., Powell C.J., Stiles M.D. J. Appl. Phys. 79:1996;2491.
20. Chopra H.D., Hockey B.J., Chen P.J., Egelhoff W.F. Jr, Wuttig M., Hua S.Z. Phys. Rev. B. 55:1997;8390.
21. Hartmann U., Mende H.H. J. Phys. D. 18:1985;2285.
22. Chopra H.D., Hua S.Z., Lashmore D.S., Wuttig M., Shull R.D., Egelhoff W.F. Jr, Swartzendruber L.J. Microscopy Anal. 28:1998;15.
23. Chopra H.D., Hua S.Z., Lashmore D.S., Wuttig M., Shull R.D., Egelhoff W.F. Jr, Swartzendruber L.J. Eur. Microscopy Anal. 28:1998;27.
24. Nomarski G., Weil A.R. Rev. Met. 52:1955;121.
25. Joint Committee on Powder Diffraction Standards (JCPDS) cards 15-806, 4-0836, 22-1189, 4-0835, published by International Centre for Diffraction Data, 12 Campus Blvd., Newton Square, PA 19073-3273.
26. Néel L. C. R. Acad. Sci., Ser. A. 255:1962;1545.
27. Néel L. C. R. Acad. Sci., Ser. A. 255:1962;1676.
28. Chopra H.D., Yang D.X., Chen P.J., Parks D.C., Egelhoff W.F. Jr. Phys. Rev. B. 61:2000;9642.
29. Chopra H.D., Yang D.X., Chen P.J., Egelhoff W.F. Jr. J. Appl. Phys. 87:2000;6986.
30. Lubitz P., Shu-Fan Cheng, Bussman K., Prinz G.A., Krebs J.J., Daughton J.M., Wang D. J. Appl. Phys. 85:1999;5027.