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Volumn 30, Issue 1, 2000, Pages 643-645
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Work function change of fresh scratched silicon surface due to gas adsorption
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRON EMISSION;
GAS ADSORPTION;
OXYGEN;
SILICON;
CONTACT POTENTIAL DIFFERENCE;
KELVIN PROBE FORCE MICROSCOPE;
TOPOGRAPHY DISTRIBUTION;
WORK FUNCTION;
SURFACE MEASUREMENT;
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EID: 0034245115
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/1096-9918(200008)30:1<643::AID-SIA747>3.0.CO;2-Z Document Type: Article |
Times cited : (2)
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References (23)
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