Room temperature wafer bonding of silicon, oxidized silicon, and crystalline quartz

Journal of Electronic Materials

Volumn 29, Issue 7, 2000, Pages 909-915

  Bengtsson, Stefan ^a   Amirfeiz, Petra ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; BONDING; CHEMICAL ACTIVATION; ELECTRIC VARIABLES MEASUREMENT; INTERFACIAL ENERGY; OXYGEN; PLASMAS; SILICA; TEMPERATURE;

CRYSTALLINE QUARTZ; PLASMA IMMERSION; ROOM TEMPERATURE WAFER BONDING;

SILICON WAFERS;

EID: 0034230008     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-000-0180-7     Document Type: Article

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