SCOPUS 정보 검색 플랫폼

Volumn 38, Issue 4, 1997, Pages 319-325

Monitoring of ultra-trace contaminants on silicon wafers for ULSI by a novel impurity extraction and AC surface photovoltage methods

(3) Shimizu, Hirofumi a Ishiwari, Shuichi a Munakata, Chusuke a,b

a HITACHI LTD (Japan)

b TOHOKU INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

ac surface photovoltage; Chemical evaluation; Inductively coupled plasma mass spectroscopy; Integrated circuits; Ion chromatography; Microcontamination; Pack extraction method; Process diagnostics; Silicon wafer; Teflon bag; Ultra trace; Vapor phase dissolution

Indexed keywords

CHROMATOGRAPHIC ANALYSIS; DISSOLUTION; IMPURITIES; INTEGRATED CIRCUIT MANUFACTURE; MASS SPECTROMETRY; NONDESTRUCTIVE EXAMINATION; PROCESS CONTROL; SURFACE CLEANING; TRACE ANALYSIS; ULSI CIRCUITS;

ION CHROMATOGRAPHY; MICROCONTAMINATION; PEAK EXTRACTION METHOD; PLASMA MASS SPECTROSCOPY; PROCESS DIAGNOSTICS; SURFACE PHOTOVOLTAGE; TEFLON BAG;

SILICON WAFERS;

EID: 0031117315 PISSN: 09161821 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans1989.38.319 Document Type: Article

Times cited : (5)

References (31)

1
- 0021625339
- Kobe, 1984, Business Center for Academic Societies Japan, Tokyo
- A. Shimazaki, H. Hiratsuka, Y. Matsushita and S. Yoshii: Ext. Abstr. 16th Conf. Solid. State Devices and Materials, Kobe, 1984, Business Center for Academic Societies Japan, Tokyo, (1984), p. 281.
- (1984) Ext. Abstr. 16th Conf. Solid. State Devices and Materials , pp. 281
- Shimazaki, A.¹ Hiratsuka, H.² Matsushita, Y.³ Yoshii, S.⁴

2
- 0028549604
- H. Shimizu and C. Munakata: Mater. Trans., JIM, 35 (1994), 827.
- (1994) Mater. Trans., JIM , vol.35 , pp. 827
- Shimizu, H.¹ Munakata, C.²

3
- 0028368880
- A. Hiraiwa and T. Itoga: IEEE Trans. Semicond. Manufac., 7 (1994), 60.
- (1994) IEEE Trans. Semicond. Manufac. , vol.7 , pp. 60
- Hiraiwa, A.¹ Itoga, T.²

4
- 0003056444
- ed. by N. Schmidt, The Electrochem. Soc. Inc., Pennington NJ
- P. Gupta, S. H. Tan, Z. Pourmotamed, F. Cristobal, N. Oshiro and B. McDonald: Proc. of the Symp. on Contamination Control and Defect Reduction in Semiconductor Manufacturing III, ed. by N. Schmidt, The Electrochem. Soc. Inc., Pennington NJ, (1994), p. 200.
- (1994) Proc. of the Symp. on Contamination Control and Defect Reduction in Semiconductor Manufacturing III , pp. 200
- Gupta, P.¹ Tan, S.H.² Pourmotamed, Z.³ Cristobal, F.⁴ Oshiro, N.⁵ McDonald, B.⁶

5
- 0014800514
- W. Kern and D. A. Puotinen: RCA Rev., 31 (1970), 187.
- (1970) RCA Rev. , vol.31 , pp. 187
- Kern, W.¹ Puotinen, D.A.²

6
- 0001215937
- T. Ohmi, I. Ichikawa, H. Iwabuchi and T. Shibata: J. Appl. Phys., 66 (1989), 4756.
- (1989) J. Appl. Phys. , vol.66 , pp. 4756
- Ohmi, T.¹ Ichikawa, I.² Iwabuchi, H.³ Shibata, T.⁴

7
- 84874519220
- Ultra Clean Society, Tokyo
- T. Ohmi: Proc. of 8th Workshop on ULSI Ultra Clean Technology, Ultra Clean Society, Tokyo, (1990), p. 5.
- (1990) Proc. of 8th Workshop on ULSI Ultra Clean Technology , pp. 5
- Ohmi, T.¹

8
- 85007914252
- M. Morita, H. Ito, T. Uehiro and K. Otsuka: Anal. Sci., 5 (1989), 609.
- (1989) Anal. Sci. , vol.5 , pp. 609
- Morita, M.¹ Ito, H.² Uehiro, T.³ Otsuka, K.⁴

9
- 37049084664
- N. Bradshaw, E. F. H. Hall and N. E. Sanderson: J. Anal. At. Spectrom., 4 (1989), 801.
- (1989) J. Anal. At. Spectrom. , vol.4 , pp. 801
- Bradshaw, N.¹ Hall, E.F.H.² Sanderson, N.E.³

10
- 19444381086
- ed. by B. O. Kolbesen, P. Stallhofer, C. Claeys and F. Tardif, PV 93-15, The Electrochem. Soc. Inc., Pennington, NJ
- L. Fabry, S. Pahlke, L. Kotz, E. Schemmel and W. Berneike: Crystalline defects, ed. by B. O. Kolbesen, P. Stallhofer, C. Claeys and F. Tardif, PV 93-15, The Electrochem. Soc. Inc., Pennington, NJ, (1993), p. 232.
- (1993) Crystalline Defects , pp. 232
- Fabry, L.¹ Pahlke, S.² Kotz, L.³ Schemmel, E.⁴ Berneike, W.⁵

11
- 0026945022
- T. Ohmi, T. Imaoka, I. Sugiyama and T. Kezuka: J. Electrochem. Soc., 139 (1992), 3317.
- (1992) J. Electrochem. Soc. , vol.139 , pp. 3317
- Ohmi, T.¹ Imaoka, T.² Sugiyama, I.³ Kezuka, T.⁴

12
- 0027575850
- J. Fucsko, S. H. Tan, M. K. Balaz: J.Electrochem. Soc., 140 (1993), 1105.
- (1993) J.Electrochem. Soc. , vol.140 , pp. 1105
- Fucsko, J.¹ Tan, S.H.² Balaz, M.K.³

13
- 0024769943
- R. S. Hockett and W. Katz: J. Electrochem. Soc., 136 (1989), 3481.
- (1989) J. Electrochem. Soc. , vol.136 , pp. 3481
- Hockett, R.S.¹ Katz, W.²

14
- 0005078111
- S. Kiyota and S. Ishiwari: Clean Technology, 4 (1994), 35.
- (1994) Clean Technology , vol.4 , pp. 35
- Kiyota, S.¹ Ishiwari, S.²

15
- 33747383194
- L. Fabry, L. Koster, S. Pahlke, L. Kotz and J. Hage: IEEE Trans. Semicond. Manuf., 9 (1996), 1.
- (1996) IEEE Trans. Semicond. Manuf. , vol.9 , pp. 1
- Fabry, L.¹ Koster, L.² Pahlke, S.³ Kotz, L.⁴ Hage, J.⁵

16
- 0021517669
- C. Munakata, S. Nishimatsu, N. Honma and K. Yagi: Jpn. J. Appl. Phys., 23 (1984), 1451.
- (1984) Jpn. J. Appl. Phys. , vol.23 , pp. 1451
- Munakata, C.¹ Nishimatsu, S.² Honma, N.³ Yagi, K.⁴

17
- 0022740053
- C. Munakata and S. Nishimatsu: Jpn. J. Appl. Phys., 25 (1986), 807.
- (1986) Jpn. J. Appl. Phys. , vol.25 , pp. 807
- Munakata, C.¹ Nishimatsu, S.²

18
- 0024013883
- C. Munakata: Jpn. J. Appl. Phys., 27 (1988), 759.
- (1988) Jpn. J. Appl. Phys. , vol.27 , pp. 759
- Munakata, C.¹

19
- 0001100979
- C. Munakata: Oyo Buturi, 53 (1984), 176.
- (1984) Oyo Buturi , vol.53 , pp. 176
- Munakata, C.¹

20
- 0023826687
- K. Kinameri, C. Munakata and K. Mayama: J. Phys. E.; Sci. Instrum., 21 (1988), 91.
- (1988) J. Phys. E.; Sci. Instrum. , vol.21 , pp. 91
- Kinameri, K.¹ Munakata, C.² Mayama, K.³

21
- 0026627207
- J. Lagowski, P. Edelman, M. Dexter and W. Henley: Semicond. Sci. Technol., 7 (1992), A185.
- (1992) Semicond. Sci. Technol. , vol.7
- Lagowski, J.¹ Edelman, P.² Dexter, M.³ Henley, W.⁴

22
- 0027578621
- L. Jastrzebski, O. Milic, M. Deter, J. Lagowski, D. Debusk, K. Nauka, R. Witowski, M. Gordon and E. Persson: J. Electrochem. Soc., 140 (1993), 1152.
- (1993) J. Electrochem. Soc. , vol.140 , pp. 1152
- Jastrzebski, L.¹ Milic, O.² Deter, M.³ Lagowski, J.⁴ Debusk, D.⁵ Nauka, K.⁶ Witowski, R.⁷ Gordon, M.⁸ Persson, E.⁹

23
- 0000859273
- H. Shimizu and C. Munakata: Appl. Phys. Lett., 64 (1994), 3598.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 3598
- Shimizu, H.¹ Munakata, C.²

24
- 0019534369
- E. Kamieniecki: J. Vac. Sci. & Technol., 20 (1982), 811;
- (1982) J. Vac. Sci. & Technol. , vol.20 , pp. 811
- Kamieniecki, E.¹

25
- 33747380626
- E. Kamieniecki: J. Vac. Sci. & Technol., 63 (1993), 2902.
- (1993) J. Vac. Sci. & Technol. , vol.63 , pp. 2902
- Kamieniecki, E.¹

26
- 0001240489
- Electrochem. Soc., Hollywood, FL
- E. Kaminiecki: Ext. Abstr., of 176th Electrochem. Soc. Fall Meeting, Vol. 89-2, Electrochem. Soc., Hollywood, FL (1989), p. 594.
- (1989) Ext. Abstr., of 176th Electrochem. Soc. Fall Meeting , vol.89 , Issue.2 , pp. 594
- Kaminiecki, E.¹

27
- 0026881311
- H. Shimizu, C. Munakata, N. Honma, S. Aoki and Y. Kosaka: Jpn. J. Appl. Phys., 31 (1992), 1817.
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 1817
- Shimizu, H.¹ Munakata, C.² Honma, N.³ Aoki, S.⁴ Kosaka, Y.⁵

28
- 33747395848
- G. Stingeder, M. Grundner and M. Grasserbauer: Sur. Inter. Anal., 11 (1988), 404.
- (1988) Sur. Inter. Anal. , vol.11 , pp. 404
- Stingeder, G.¹ Grundner, M.² Grasserbauer, M.³

29
- 0010598553
- ed. by H. R. Huff, T. Abe and B. Kolbesen, Electrochem. Soc., Pennington
- S. Kawado, T. Tanigaki, T. Maruyama, M. Yamasaki, O. Nishima and Y. Oka: Semiconductor Silicon 1986, ed. by H. R. Huff, T. Abe and B. Kolbesen, Electrochem. Soc., Pennington, (1986), p. 989.
- (1986) Semiconductor Silicon 1986 , pp. 989
- Kawado, S.¹ Tanigaki, T.² Maruyama, T.³ Yamasaki, M.⁴ Nishima, O.⁵ Oka, Y.⁶

30
- 0026900538
- H. Shimizu and C. Munakata: Jpn. J. Appl. Phys., 31 (1992), 2319.
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 2319
- Shimizu, H.¹ Munakata, C.²

31
- 0025484946
- H. Shimizu and C. Munakata: Semicond. Sci. Technol., 5 (1990), 991.
- (1990) Semicond. Sci. Technol. , vol.5 , pp. 991
- Shimizu, H.¹ Munakata, C.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.