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Volumn 18, Issue 4 II, 2000, Pages 1853-1858

Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulation

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELECTRON MICROSCOPY; ENCAPSULATION; ETCHING; HYDROFLUORIC ACID; MECHANICAL PERMEABILITY; MICROSENSORS; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; THIN FILMS; VACUUM APPLICATIONS;

EID: 0034227422     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582435     Document Type: Article
Times cited : (12)

References (24)
  • 23
    • 0007024890 scopus 로고    scopus 로고
    • The program was developed at the U.S. National Institutes of Health and available from the Internet by anonymous FTP from or on floppy disk from the National Technical Information Service, Springfield, Virginia, part number PB95-500195GEI
    • The program was developed at the U.S. National Institutes of Health and available from the Internet by anonymous FTP from zippy.nimh.nih.gov or on floppy disk from the National Technical Information Service, Springfield, Virginia, part number PB95-500195GEI.
  • 24
    • 0007123893 scopus 로고
    • Ph.D. thesis, TR No. G502-10, Stanford University, CA
    • E. K. Demirlioglu, Ph.D. thesis, TR No. G502-10, Stanford University, CA, 1988.
    • (1988)
    • Demirlioglu, E.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.