Kinetic rate expression for tungsten chemical vapor deposition in different WF6 flow regimes from step coverage measurements

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 91, Issue 7, 2000, Pages 573-580

  McInerney, E J ^a,c   Srinivasan, E ^a,c   Smith, D C ^a,c   Ramanath, G ^b  

^a Novellus Systems   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c Novellus Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DESORPTION; DISSOCIATION; HYDROGEN; MASS TRANSFER; MATHEMATICAL MODELS; METALLIC FILMS; RATE CONSTANTS; REDUCTION; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

DEPOSITION KINETICS; FILM THICKNESS; TUNGSTEN FILM;

TUNGSTEN;

EID: 0034226858     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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