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Volumn 35, Issue 14, 2000, Pages 3631-3639
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Oxidation behavior of hot isostatically pressed silicon nitride containing Y2O3
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINA;
AUGER ELECTRON SPECTROSCOPY;
CERAMIC MATERIALS;
CRYSTALLIZATION;
HEAT TREATMENT;
HIGH TEMPERATURE EFFECTS;
HOT ISOSTATIC PRESSING;
OPTICAL MICROSCOPY;
OXIDATION;
SCANNING ELECTRON MICROSCOPY;
SINTERING;
YTTRIUM COMPOUNDS;
APPLIED STRESS;
SODIUM CONTAMINATION;
STRESS OXIDATION TEST;
WATER VAPOR;
YTTRIA;
SILICON NITRIDE;
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EID: 0034226820
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1004877916672 Document Type: Article |
Times cited : (4)
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References (12)
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