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Volumn 21, Issue 7, 2000, Pages 359-361

Impacts of control gate voltage on the cycling endurance of split gate flash memory

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED CIRCUIT TESTING; POLYSILICON; PROM; VOLTAGE CONTROL;

EID: 0034217293     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.847380     Document Type: Article
Times cited : (19)

References (9)
  • 1
    • 0024870476 scopus 로고
    • A new flash-erase EEPROM cell with a select-gate on its source side
    • K. Naruke et al., "A new flash-erase EEPROM cell with a select-gate on its source side," in IEDM Tech. Dig., 1989, pp. 603-606.
    • (1989) IEDM Tech. Dig. , pp. 603-606
    • Naruke, K.1
  • 2
    • 11744374702 scopus 로고    scopus 로고
    • A 5 V-only 16 m flash memory using a contactless array of source-side injection cells
    • K. Kwon et al., "A 5 V-only 16 m flash memory using a contactless array of source-side injection cells," in Proc. VLSI Circuits Dig. Tech. Papers, pp. 77-78.
    • Proc. VLSI Circuits Dig. Tech. Papers , pp. 77-78
    • Kwon, K.1
  • 3
    • 0027803216 scopus 로고
    • A high efficiency flash EEPROM cell for embedded memory applications
    • J. Van Houdt et al., "A high efficiency flash EEPROM cell for embedded memory applications," IEEE Trans. Electron Devices, vol. 40, p. 2255, 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 2255
    • Van Houdt, J.1
  • 4
    • 0028602570 scopus 로고
    • A novel high density contactless flash memory array using split-gate source-side injection cell for 5 V-only applications
    • Y. Ma et al., "A novel high density contactless flash memory array using split-gate source-side injection cell for 5 V-only applications," in Proc. Symp. VLSI Technology Tech. Dig., 1994, p. 49.
    • (1994) Proc. Symp. VLSI Technology Tech. Dig. , pp. 49
    • Ma, Y.1
  • 5
    • 0022985546 scopus 로고
    • A novel high-speed, 5-V programming EPROM structure with source-side injection
    • T. Wu, T. Y. Chan, P. K. Ko, and C. Hu, "A novel high-speed, 5-V programming EPROM structure with source-side injection," in IEDM Tech. Dig., 1986, pp. 584-587.
    • (1986) IEDM Tech. Dig. , pp. 584-587
    • Wu, T.1    Chan, T.Y.2    Ko, P.K.3    Hu, C.4
  • 6
    • 0026866734 scopus 로고
    • Analysis of the enhanced hot-electron injection in split-gate transistors useful for EEPROM applications
    • May
    • J. V. Houdt et al., "Analysis of the enhanced hot-electron injection in split-gate transistors useful for EEPROM applications," IEEE Trans. Electron Devices, vol. 39, pp. 1150-1156, May 1992.
    • (1992) IEEE Trans. Electron Devices , vol.39 , pp. 1150-1156
    • Houdt, J.V.1
  • 7
    • 0028607820 scopus 로고
    • A novel 3 volts-only, small sector erase, high density flash EEPROM
    • S. Kianian, A. Levi, D. Lee, and Y.-W. Hu, "A novel 3 volts-only, small sector erase, high density flash EEPROM," in Symp. VLSI Technology Dig., 1994, p. 71.
    • (1994) Symp. VLSI Technology Dig. , pp. 71
    • Kianian, S.1    Levi, A.2    Lee, D.3    Hu, Y.-W.4
  • 9
    • 0031186107 scopus 로고    scopus 로고
    • 2O annealing of interpoly oxide
    • July
    • 2O annealing of interpoly oxide," IEEE Electron Device Lett., vol. 18, p. 343, July 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 343
    • Jong, F.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.